New Product Overview

VLSI chips, the backbone of the IT revolution, continue to shrink and become more complex. The semiconductor industry is transitioning to development and high volume manufacturing of next-generation process devices, with the most critical layers exposed using ArF immersion scanners and incorporating multiple patterning. However, many layers will still be processed using dry 193 nm lithography. This necessitates non-immersion scanners that can also deliver superior overlay accuracy with maximized throughput.

The NSR-S322F is the most advanced dry ArF scanner for high volume manufacturing, and delivers optimum performance and productivity. The S322F also builds on established Streamlign platform technology to enable faster installation and production ramp at a customer site.

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